Patterning large-area devices with a 5:1 reduction stepper

Contact or proximity aligners or 1:1 projection aligners are conventionally used for patterning large-area devices like silicon strip detectors for high-energy particle detection. Reduction steppers offer a far better pattern fidelity and an increased productivity but a very limited field size. This paper describes methods to overcome the field size limitations to pattern large-area position-sensitive particle detectors automatically and accurately with a 5:1 reduction stepper.