
Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis
Keywords: 52.25.Mq; 82.80.Gk; 73.50.Td; 68.55.Nq; 82.80.–d; 36.20.Hb; 68.35.DvDielectric barrier discharge (DBD); Hydrogenated carbon nitride film (aH-CNx); NMR; FTIR spectroscopy; Elemental analysis (chemical)