Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Polarizable interface; Surface analysis; EIS; CS-AFM;
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Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Hybrid deposition; RF sputtering; Optical property; Electrical property;
Directional electron delivery and enhanced reactants activation enable efficient photocatalytic air purification on amorphous carbon nitride co-functionalized with O/La
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Photocatalysis mechanism; NO removal; Electron delivery pathway; Reactants activation;
High N-content a-C:N films elaborated by femtosecond PLD with plasma assistance
Keywords: نیترید کربن آمورف; Carbon nitride; Plasma assistance; Femtosecond laser; PLD; XPS; EELS; MW Raman spectroscopy; a-C; amorphous carbon; a-C:N; amorphous carbon nitride; Biased a-C:N; DC plasma assistance deposited amorphous carbon nitride;
Sticking probability of CN radicals
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; CN radicals; Laser-induced fluorescence spectroscopy; Sticking probability; Plasma chemical reaction
Effect of nitrogen on the optoelectronic properties of a highly sp2-rich amorphous carbon nitride films
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Sputtering; Vibrational property characterization; optical property characterization
Microstructure and tribological behavior of pulsed laser deposited a-CNx films
Keywords: نیترید کربن آمورف; Carbon-based coatings; Wear testing; Amorphous carbon nitride; Pulsed laser deposition;
Coating of carbon nanotubes with amorphous carbon nitride thin films and characterization of long-term emission stability
Keywords: نیترید کربن آمورف; Carbon nanotube; Amorphous carbon nitride; Thermal treatment; Field emission; Longterm-stability
Fabrication, microstructure and tribological behavior of pulsed laser deposited a-CNx/TiN multilayer films
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Multilayer film; Friction and wear; Pulsed laser deposition;
Microstructure, optical and electrical properties of nitrogen doped sp2-rich a-C thin films grown by facing-target magnetron sputtering
Keywords: نیترید کربن آمورف; 81.15.Cd; 61.43.Dq; 81.05.Uw; 78.66.Jg; 73.61.Jc; 71.55.Jv; Magnetron sputtering; Amorphous carbon nitride; Optical properties; Electrical properties; Defects;
Deposition of mechanically hard amorphous carbon nitride films with high [N] / ([N] + [C]) ratio
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Microwave plasma CVD; Hardness; IR spectra; Raman spectra
Production and deposition of CN radicals to produce amorphous carbon nitride films with high [N]/([N] + [C]) ratio
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Microwave plasma CVD; Laser-induced fluorescence spectra; Electrostatic probe
Hydrogenated amorphous carbon nitride with controlled hydrogen density — Structural analysis and electric field emission property
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; ECRCVD; ZnO:Al whisker; Electric field emission
Synthesis and characterization of microporous carbon nitride
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Microporous; HZSM-5; Zeolite; Carbonization
Mechanism of dissociative excitation of BrCN in electron cyclotron resonance plasma flow of He
Keywords: نیترید کربن آمورف; ECR plasma; Dissociation; Optical emission; CN radicals; Amorphous carbon nitride;
Screen-printed carbon electrode modified on its surface with amorphous carbon nitride thin film: Electrochemical and morphological study
Keywords: نیترید کربن آمورف; Reactive magnetron sputtering; Amorphous carbon nitride; Screen printed; Carbon electrode; Electrochemical reactivity; Thin film
Measurements of density and sticking probability of CN(X2Σ+) radicals by laser-induced fluorescence spectroscopy
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Chemical-vapor deposition (CVD); Plasma processing and deposition; Sticking probability;
Patterning of organic light-emitting diodes utilizing a sputter deposited amorphous carbon nitride buffer layer
Keywords: نیترید کربن آمورف; Organic light-emitting diode; Patterning; Amorphous carbon nitride; Photolithography
XPS study of amorphous carbon nitride (a-C:N) thin films deposited by reactive RF sputtering
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; XPS; RF sputtering
Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition
Keywords: نیترید کربن آمورف; Surface wave; Microwave; Methane; Gas flow rate; Amorphous carbon nitride; a-C:N
Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Filtered cathodic arc; Optical emissions;
Study on amorphous carbon nitride film prepared by facing target sputtering
Keywords: نیترید کربن آمورف; 81.05.Je; 81.15.Cd; 82.80.Pv; 78.30.Ly; Amorphous carbon nitride; Facing target sputtering; X-ray photoelectron spectroscopy (XPS); Raman scattering;
Surface induced bulk modifications of amorphous carbon nitride films by post-deposition oxygen and hydrogen plasma treatment
Keywords: نیترید کربن آمورف; 68.35.Fx; 68.55.-a; 85.40.Sz; 85.40.Ry; Amorphous carbon nitride; X-ray photoelectron spectroscopy; Optical properties; Sputtering;
Friction and wear property of a-CNx coatings sliding against ceramic and steel balls in water
Keywords: نیترید کربن آمورف; Amorphous carbon nitride; Friction; Wear; Water lubrication; Oxidation resistance;