کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7111355 1460768 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structural, electrical, and optical properties of amorphous carbon nitride films prepared using a hybrid deposition technique
ترجمه فارسی عنوان
خواص ساختاری، الکتریکی و نوری فیلمهای نیترید کربن آمورف تولید شده با استفاده از روش رسوب ترکیبی
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
چکیده انگلیسی
Amorphous carbon nitride (a-CNx) thin films were prepared using a hybrid deposition technique (HDT), which is a combination of RF and DC magnetron co-sputtering of a graphite target. We varied the nitrogen gas flow ratio (GFR, N2/N2 + Ar) during deposition to prepare a-CNx films with various nitrogen concentrations. The film properties were characterized using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The optical and electrical properties were also investigated. For 0.3 < GFR < 1, the optical band gap and resistivity increased with increasing nitrogen concentration (x = N/C) and sp3 C-N bonding fraction in the films. Compared to carbon nitride films with a comparable nitrogen content prepared by RF and DC sputtering, the optical band gap and resistivity of a-CNx films prepared by HDT were narrower and lower, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 63, March 2016, Pages 120-124
نویسندگان
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