Keywords: لیتوگرافی غوطه وری; Immersion lithography; Flow behavior control; Pure liquid; Meniscus stability;
مقالات ISI لیتوگرافی غوطه وری (ترجمه نشده)
مقالات زیر هنوز به فارسی ترجمه نشده اند.
در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
Keywords: لیتوگرافی غوطه وری; Contact line pinning; Discontinuous pinning effect; Gas-liquid interface; Liquid control; Immersion lithography;
Keywords: لیتوگرافی غوطه وری; Submerged jets; Gas-liquid mixture; Micro-channel; Immersion lithography;
Keywords: لیتوگرافی غوطه وری; E-beam maskless lithography; Immersion lithography; EUV lithography; Overlay accuracy; Resolution; Defect and cost
Keywords: لیتوگرافی غوطه وری; Slip flow; Micro/nano gaps; Velocity distribution; Immersion lithography
Keywords: لیتوگرافی غوطه وری; Silicon photonics; Optical integrated circuits; Waveguides; Coupled resonator optical waveguides; Immersion lithography
Leaching and drying marks on photoresist-coated substrates
Keywords: لیتوگرافی غوطه وری; Defect; Drying; Photoresist; Droplet; Watermarks; Immersion lithography; Roughness
Thermal behavior of wafers and its effects on overlay performance in immersion lithography
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Wafer thermal stabilities; Overlay performance
Effect of upper surface characteristics on meniscus stability in immersion flow field
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Meniscus stability; Liquid loss; Dynamic model; Immersion unit
Polarimetric diagnosis of 193-nm lithography equipment using a mask with newly developed polarization optical elements
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Polarimetry; Stokes parameters; Mueller matrix;
Investigation on the critical velocity for liquid loss in immersion lithography
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Noncontact sealing; Critical velocity model; Head loss
Challenges in using optical lithography for the building of a 22 nm node 6T-SRAM cell
Keywords: لیتوگرافی غوطه وری; SRAM scaling; 22 nm node; Litho-friendly circuit layout; Patterning; Immersion lithography
Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Polarized illumination; Normalized image log slope; Exposure defocus window
Influences of water on photoresist surface in immersion lithography technology
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Photoresist; Photoacid generator; TOF-SIMS; XPS; LC-MS;
Polarimetry of illumination for 193 nm immersion lithography
Keywords: لیتوگرافی غوطه وری; Polarimetry; Immersion lithography; Stokes parameters
A study of 193-nm immersion lithography using novel high refractive index fluids
Keywords: لیتوگرافی غوطه وری; 193-nm; Immersion lithography; High refractive index; Fluids
Removal mechanism of nano-bubble with AFM for immersion lithography
Keywords: لیتوگرافی غوطه وری; Nano-scale bubble; Atomic force microscope; Immersion lithography; ArF and F2 excimer resists; Thermodynamics; Adhesion; Removal
Enhancement of near-field phase-shifting contact lithography by immersion technique
Keywords: لیتوگرافی غوطه وری; Immersion lithography; Contact lithography; Phase-shift; Specific absorption rate
The ending of optical lithography and the prospects of its successors
Keywords: لیتوگرافی غوطه وری; Microlithography; Optical lithography; Immersion lithography; EUV lithography; E-beam lithography; Direct write lithography
Optical lithography-a historical perspective
Keywords: لیتوگرافی غوطه وری; Optical lithography; Photoresist; Phase shifting mask; Optical proximity correction; 157 nm lithography; Immersion lithography; EUV lithography; Lithographie optique; Résine photosensible; Masque à décalage de phase; Correction d'effets de proximité;