Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures
Keywords: اکسیداسیون دمای پایین; 81.6.Cp; 73.40.Qv; 73.61.Ng; 85.40.Hp; Nitric acid oxidation; Low temperature oxidation; Si; Ultrathin oxide; Metal-oxide-semiconductor (MOS); Gate oxide;