Enhanced thermal and morphological stability of Ni(Si1âxGex) growth on BF2+-preamorphized Si0.8Ge0.2 substrate
Keywords: 68.55.Ln; 61.72.Tt; 68.55.âa; 68.37.Lp; Germanosilicide; Preamorphization; SiGe; Implantation; Ni silicide;