Real-time in-situ investigation of copper ultrathin films growth

The results of real-time in-situ spectroscopic investigation of copper films growth are presented. The films were deposited on fused silica substrates by magnetron sputtering. Three growing stages of copper films were in-situ, ex-situ analysed and compared with modelled values. The minimum continuous film thickness of about 10 nm was determined by such comparison. This new empirical method might be applied for multilayer coatings deposition.