کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10417607 | 902530 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Neural network based modeling of PL intensity in PLD-grown ZnO thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی صنعتی و تولید
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چکیده انگلیسی
The process modeling of ZnO thin films grown by pulsed laser deposition (PLD) was investigated using neural networks based on radial basis function networks (RBFN) and multi-layer perceptron (MLP). Two input factors were examined with respect to the response factor, photoluminescence (PL), which is one of the main factors to determine the optical characteristic of the structure. In order to minimize the joint confidence region of fabrication process with varying the conditions, D-optimal experimental design technique was performed and PL intensity was characterized by neural networks. The statistical results were then used to verify the fitness of the nonlinear process model. Based on the results, this modeling methodology can optimize the process conditions for semiconductor manufacturing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Materials Processing Technology - Volume 159, Issue 2, 30 January 2005, Pages 159-163
Journal: Journal of Materials Processing Technology - Volume 159, Issue 2, 30 January 2005, Pages 159-163
نویسندگان
Young-Don Ko, Hong Seong Kang, Min-Chang Jeong, Sang Yeol Lee, Jae-Min Myoung, Ilgu Yun,