Nanostructured CNx (0 < x < 0.2) films grown by supersonic cluster beam deposition

Nanostructured CNx thin films were prepared by supersonic cluster beam deposition (SCBD) and systematically characterized by transmission electron microscopy (TEM), electron energy-loss spectroscopy (EELS), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The incorporation of nitrogen in the films (0 < x < 0.2) and the nanostructure were controlled by using different synthesis routes. Films containing bundles of well-ordered graphene multilayers, onions and nanotubes embedded in an amorphous matrix were grown alongside purely amorphous films by changing the deposition parameters. Graphitic nanostructures were synthesized without using metallic catalysts. The structural and electronic properties of the films have been studied by EELS. The role played by N in the carbon nanostructures has been deduced from XPS line-shape analysis.