Optical properties and chemical bonding characteristics of amorphous SiNX:H thin films grown by the plasma enhanced chemical vapor deposition method

► Amorphous SiNX:H thin films were grown using plasma enhanced chemical vapor deposition. ► Growth rate, optical and chemical bonding characteristics of SiNX:H thin films were studied. ► Rapid thermal processing caused changes in microstructural and optical properties of SiNX:H.