Remote plasma deposition of microcrystalline silicon thin-films: Film structure and the role of atomic hydrogen

► In depth analysis of remote-plasma deposited μc-Si:H films is presented. ► The poor μc-Si:H film quality is linked to an insufficient amount of a-Si:H tissue. ► It has been investigated whether atomic H is responsible. ► H-induced etching of a-Si:H tissue does not compete with μc-Si:H film growth. ► Nor does hydrogen incorporation lead to an increased a-Si:H film porosity.