Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina

► The effect of target erosion on the deposition rate of alumina thin films is studied. ► Target erosion dramatically affects the hysteresis behavior of the system. ► Depositions were made within the hysteresis transition region using a feedback loop. ► The deposition rate depends on the cathode voltage relative to the hysteresis behavior. ► The deposition rate can be controlled by the relative voltage set-point.