Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering

► Ti2AlN phase can be formed after annealing Ti-Al-N films at 700 °C via solid state reaction. ► The critical value of nitrogen concentration for the phase formation is in the range of 22.5-29.6 at.%. ► The fractographs change from columnar to equiaxed crystals after the formation of Ti2AlN phase. ► The microhardness of the films composed of Ti2AlN phase shows a good value of 18-24 GPa.