Deposition of alpha-WC/a-C nanocomposite thin films by hot-filament CVD

►We demonstrate the deposition of α-WC/a-C coatings using an HFCVD reactor. ►With this method the α-WC thickness and the a-C content are easily controllable. ►Tungsten evaporation time is the main parameter influencing the film thickness. ►The a-C content in the coatings is mainly controlled by the CH4/H2 flow ratio.