Investigations of plasma polymerized SiOx barrier films for polymer food packaging

Finally, the barrier properties towards water vapor of 100 nm thick SiOx films deposited from different O2:HMDSN gas mixtures were contrasted with their corresponding barrier properties towards O2. The minimum water vapor and O2 permeation results were found for the SiOx films plasma deposited from almost identical O2:HMDSN gas mixture ratios in the range of 25 ≤ x ≤ 30.