Characterization of ZrOxCyHz thin films deposited by MMP-DECR reactor using Zirconium Tert-Butoxide/O2 mixture

Thin films are deposited in a multipolar microwave plasma reactor excited by distributed electron cyclotron resonance (MMP-DECR) using Zirconium Tert-Butoxide (ZTB) as precursor and characterized in function of two process parameters: microwave power and ratio gas mixture (O2/ZTB + O2). Their influences on deposition rate, density, chemical bonds, atomic composition and microstructure of the deposits are presented: for pure ZTB plasma the films contain a high rate of hydrocarbon and their density is low (close to hydrogenated carbon film density). The study versus microwave power shows that film contains less hydrocarbon at high power than at low power but the addition of O2 to ZTB appears to be mainly responsible for hydrocarbon removal. Moreover microstructure analysis shows a columnar growth when a high amount of O2 (≥ 90%) is added in the gas mixture.