کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668507 | 1008373 | 2011 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural and photoelectrochemical properties of Ti1âxWxO2 thin films deposited by magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
W-doped titanium dioxide is a promising candidate material for applications ranging from UV-VIS light photocatalytic reactions to catalyst support in proton-exchange membrane fuel cells, depending on the doping content. The present study reports on the possibility to synthesize substitutional Ti1âxWxO2 thin films with 0 â¤Â x â¤Â 1 by magnetron co-sputtering from Ti and W metallic targets. Two routes were investigated starting from 1) crystalline titanium tungsten alloys deposited in non-reactive (pure Ar) mode, and 2) amorphous titanium tungsten oxides deposited in reactive (Ar + O2 atmosphere) mode. The structure and phase stability after air annealing at 550 °C has been investigated by X-ray Diffraction (XRD). X-ray Reflectivity (XRR) was used to determine the change in film mass density upon annealing. Films of the non-reactive mode series could not be successfully fully oxidized into Ti1âxWxO2 form. For the reactive mode film series, ternary Ti1âxWxO2 oxides were obtained after air annealing and the crystal structure was changed from anatase to rutile with increasing W content in the range 0-33 at.%. Films with higher W content (0.33< x â¤Â 1) eventually crystallized in the WO3 triclinic structure. Photo-electrodes were elaborated from the deposited thin films on FTO coated glass, and they all showed photo-response when tested in acid solution, under UV-VIS illumination. Among the doped materials, the Ti0.92W0.08O2 thin film showed the highest photo-current.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S265-S270
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S265-S270
نویسندگان
G. Abadias, A.S. Gago, N. Alonso-Vante,