کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668557 | 1008373 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterization of the plasma plume of a PIAD plasma source by means of optical emission spectroscopy
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
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چکیده انگلیسی
The understanding of the generation of fast ions in the advanced plasma source (APS) is important for the improvement of optical coatings. This requires a detailed characterization of the radial and axial distributions of plasma parameters in the expanding plasma downstream of the APS - the plasma plume. In an industrial vacuum chamber (1.1 m3 volume) diagnostics for optical emission spectroscopy (OES) have been installed. Radial profiles of line emission on an absolute scale are obtained by data deconvolution. First results based on a simple Corona model applied on a Helium-Argon mixture confirm the values obtained by Langmuir probe measurements. In the downstream region of the APS (10 cm-30 cm from its outlet), electron temperatures in the order of 5 to 10 eV and densities of about 1010 cmâ 3 are obtained.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S407-S410
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S407-S410
نویسندگان
J. Harhausen, I. Meyenburg, A. Ohl, R. Foest,