کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10668558 | 1008373 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characteristics of SiH4/H2 VHF plasma produced by short gap discharge
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60Â MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S411-S414
Journal: Surface and Coatings Technology - Volume 205, Supplement 2, 25 July 2011, Pages S411-S414
نویسندگان
Tatsuyuki Nishimiya, Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai,