Glass surface modification by lithography-free reactive ion etching in an Ar/CF4-plasma for controlled diffuse optical scattering

► Nano- and microstructuring of glasses by self-masking during reactive ion etching. ► Realization of different roughness morphologies leading to dosed optical scattering. ► Reproducible structuring of different types of glass. ► Up-scaling to 9cm diameter sample shown, likely possible for much larger substrates.