Material utilisation when depositing CdTe layers by inline AP-MOCVD

► CdTe layers deposited with an inline AP-MOCVD process as an alternative path to high throughput process. ► Over 40% material utilisation can be achieved depending on deposition parameters. ► Substrate temperature and total flow were critical parameters. ► The activation energy was found to be 49 kJ mol−1 and in agreement with literature.