کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10707508 | 1023647 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth of GaN film on Si (1Â 1Â 1) substrate using AlN sandwich structure as buffer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A single high temperature AlN (HT-AlN) buffer has been used to relieve the stress in the growth of GaN epilayers on Si (1 1 1) substrates, but the growth of crack-free GaN on Si is still difficult due to the large mismatch of the lattice and coefficient of thermal-expansion (CTE) between GaN and Si. In this paper, we report the growth of 1.2 μm thick crack-free GaN epilayers on 2 in. Si (1 1 1) substrates using the AlN sandwich structure as a buffer. The surface morphologies of the samples were observed using a microscope and AFM. Further analysis shows that the crack-free sample is closely correlated to the introduction of the AlN sandwich structure as the buffer. To better understand the relationship between the cracks and the stress, Raman scattering has been used to study the stress in the samples. The results indicate that the sandwich structure with top AlN and bottom AlN can more effectively accommodate the strain energy caused by CTE mismatch stress.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 318, Issue 1, 1 March 2011, Pages 464-467
Journal: Journal of Crystal Growth - Volume 318, Issue 1, 1 March 2011, Pages 464-467
نویسندگان
Xu Pan, Meng Wei, Cuibai Yang, Hongling Xiao, Cuimei Wang, Xiaoliang Wang,