کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10715703 1027345 2011 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Analysis of bias effects on the total ionizing dose response in a 180 nm technology
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم ابزار دقیق
پیش نمایش صفحه اول مقاله
Analysis of bias effects on the total ionizing dose response in a 180 nm technology
چکیده انگلیسی
► ON bias is the worst bias condition for the ON, PASS and OFF bias modes. ► Larger gate bias during irradiation leads to more pronounced characteristic degradation. ► TID induced STI leakage can be suppressed by negative operating substrate bias voltage. ► Negative substrate bias during irradiation leads to larger increase of off-state leakage. ► Electric field in the STI oxide greatly influences the device's radiation effect.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 644, Issue 1, 11 July 2011, Pages 48-54
نویسندگان
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