کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10715703 | 1027345 | 2011 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis of bias effects on the total ionizing dose response in a 180Â nm technology
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
ابزار دقیق
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Analysis of bias effects on the total ionizing dose response in a 180Â nm technology Analysis of bias effects on the total ionizing dose response in a 180Â nm technology](/preview/png/10715703.png)
چکیده انگلیسی
⺠ON bias is the worst bias condition for the ON, PASS and OFF bias modes. ⺠Larger gate bias during irradiation leads to more pronounced characteristic degradation. ⺠TID induced STI leakage can be suppressed by negative operating substrate bias voltage. ⺠Negative substrate bias during irradiation leads to larger increase of off-state leakage. ⺠Electric field in the STI oxide greatly influences the device's radiation effect.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 644, Issue 1, 11 July 2011, Pages 48-54
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 644, Issue 1, 11 July 2011, Pages 48-54
نویسندگان
Zhangli Liu, Zhiyuan Hu, Zhengxuan Zhang, Hua Shao, Ming Chen, Dawei Bi, Bingxu Ning, Shichang Zou,