Keywords: تعصب بستر; Metal-containing amorphous carbon; Sputter deposition; Substrate bias; Ion bombardment; Nano-particles;
مقالات ISI تعصب بستر (ترجمه نشده)
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Keywords: تعصب بستر; Junctionless nanowire transistors; Low-frequency noise; Effective trap density; Substrate bias;
Keywords: تعصب بستر; Gas flow sputtering; Reactive sputtering; Yttria stabilized zirconia; Thermal barrier coatings; Substrate bias; Oxygen flow rate; Morphology; Microstructure; Grain orientation; Thermal cycling;
Keywords: تعصب بستر; HiPIMS; HPPMS; Pulsed DCMS; SOFC; YSZ; Substrate bias;
Keywords: تعصب بستر; Nanoindentation; Field-emission; Ammonia gas sensing; a-C: N: nc films; Nanocrystallites; Substrate bias; FAJCA;
Keywords: تعصب بستر; Aluminum nitride thin film (AlN); High power impulse magnetron sputtering (HIPIMS); Taguchi analysis; Analysis of variance (ANOVA); Pulse frequency; Duty cycle; Transmittance; Substrate bias
Improvement in crystallinity of ZnO and Zn2SiO4 phases by rf sputter deposition; effect of substrate bias
Keywords: تعصب بستر; Crystalline; ZnO; Zn2SiO4; Defects; Substrate bias;
ECR plasma deposited a-SiCN:H as insulating layer in piezoceramic modules
Keywords: تعصب بستر; ECR plasma; Substrate bias; Silicon carbonitride; Mechanical properties; Electrical properties;
Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method
Keywords: تعصب بستر; Substrate bias; Ar pressure; Transmission; Optical band gap; Urbach energy;
Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films
Keywords: تعصب بستر; Vanadium nitride; Magnetron sputtering; Substrate bias; High power impulse magnetron sputtering; HiPIMS;
Influence of deposition conditions on mechanical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method
Keywords: تعصب بستر; a-C:H:SiOx films; Plasma CVD; Substrate bias; FTIR spectroscopy;
Investigations on the substrate bias influence on reactive HPPMS plasmas
Keywords: تعصب بستر; PVD; HPPMS/HiPIMS; (Cr,Al)N; Industrial scale coating unit; Substrate Bias; Optical emission spectroscopy; Energy resolved mass spectroscopy; Langmuir probe;
Effect of substrate bias voltage on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings
Keywords: تعصب بستر; HIPIMS; CrN/NbN; Growth defects; Defect density; Substrate bias; Corrosion; Tribology;
Improved interfacial adhesion between TiAlN/DLC multi-layered coatings by controlling the morphology via bias
Keywords: تعصب بستر; TiAlN/DLC; Interfacial adhesion; Morphology; Substrate bias;
High power impulse magnetron sputtered p-type γ-titanium monoxide films: Effects of substrate bias and post-annealing on microstructure characteristics and optoelectrical properties
Keywords: تعصب بستر; Titanium monoxide (TiO); High power impulse magnetron sputtering (HIPIMS); Substrate bias; Post-annealing;
Variation of local chemical compositions of (Ti, Al)N films on inner wall of small hole deposited by high-power impulse magnetron sputtering
Keywords: تعصب بستر; High-power impulse magnetron sputtering; (Ti, Al)N films; Small holes; Inner-wall; Chemical composition; Substrate bias;
Effects of substrate bias voltage on mechanical properties and tribological behaviors of RF sputtered multilayer TiN/CrAlN films
Keywords: تعصب بستر; TiN/CrAlN films; RF magnetron sputtering; Substrate bias; Mechanical properties; Tribological properties;
Influence of Substrate Negative Bias on Structure and Properties of TiN Coatings Prepared by Hybrid HIPIMS Method
Keywords: تعصب بستر; TiN; Hybrid HIPIMS; Substrate bias; Microstructure; Mechanical properties;
Enhancement of the mechanical properties of AZ31 magnesium alloy via nanostructured hydroxyapatite thin films fabricated via radio-frequency magnetron sputtering
Keywords: تعصب بستر; Magnesium alloy; Hydroxyapatite coating; RF magnetron sputtering; Substrate bias; Hardness; Young׳s modulus; Wear resistance
Effect of substrate bias on microstructure and properties of Ni–TiN nanocomposite thin films deposited by reactive magnetron co-sputtering
Keywords: تعصب بستر; Nanocomposite thin films; Reactive magnetron co-sputtering; Substrate bias; Residual stress; Nano-triboindentation behavior; Electrical resistivity
Two-step method for the deposition of AlN by radio frequency sputtering
Keywords: تعصب بستر; Semiconductors; Aluminum nitride; Sputtering; Substrate bias; High resolution X-ray diffraction; Two-step method;
Effect of substrate bias and hydrogen addition on the residual stress of BCN film with hexagonal structure prepared by sputtering of a B4C target with Ar/N2 reactive gas
Keywords: تعصب بستر; BCN with hexagonal structure; Compressive residual stress; Hydrogen addition; Ar incorporation; Substrate bias
Low-temperature crystallization and hardness enhancement of alumina films using the resputtering technique
Keywords: تعصب بستر; Resputtering; Crystalline alumina films; Deposition temperature; Substrate bias; Hardness
Structural control of carbon nickel nano-composite thin films without substrate heating
Keywords: تعصب بستر; Carbon; Nickel; Nano-composite; Ionised magnetron sputter deposition; Substrate bias; Carbon–metal composite thin film
Characterization and properties of amorphous carbon coatings prepared by middle frequency pulsed unbalanced magnetron sputtering at different substrate bias
Keywords: تعصب بستر; Amorphous carbon coating; Substrate bias; Properties;
Role of ion energy on growth and optical dispersion of nanocrystalline TiO2 films prepared by magnetron sputtering with ion assistance at the substrate
Keywords: تعصب بستر; Rutile TiO2; Reactive sputtering; Substrate bias; Ion energy; Optical dispersion;
Effect of nitrogen content and substrate bias on mechanical and corrosion properties of high-entropy films (AlCrSiTiZr)100 â xNx
Keywords: تعصب بستر; High-entropy alloy; High-entropy nitride film; Anodic polarization curve; Sulfuric acid; Substrate bias; Corrosion resistance;
Effect of substrate bias in hydrogenated amorphous carbon films having embedded nanocrystallites deposited by cathodic jet carbon arc technique
Keywords: تعصب بستر; Hydrogenated amorphous carbon; Nanocrystallites; Cathodic jet carbon arc; Substrate bias
Effect of substrate bias and temperature on magnetron sputtered CrSiN films
Keywords: تعصب بستر; CrSiN film; DC magnetron sputtering; Substrate bias; Substrate temperature;
Effect of copper content and substrate bias on structure and mechanical properties of reactive sputtered CrCuN films
Keywords: تعصب بستر; CrCuN film; DC magnetron sputtering; Substrate bias; Cu content; Preferred orientation; Morphology
The effect of substrate bias voltage on PbTe films deposited by magnetron sputtering
Keywords: تعصب بستر; PbTe films; Magnetron sputtering; Substrate bias;
Analysis of bias effects on the total ionizing dose response in a 180Â nm technology
Keywords: تعصب بستر; Bias condition; Oxide trapped charge; Shallow trench isolation; Substrate bias; Total ionizing dose;
Effect of substrate bias in amorphous carbon films having embedded nanocrystallites
Keywords: تعصب بستر; Amorphous carbon; Nanocrystallites; Filtered cathodic jet carbon arc; Substrate bias;
X-ray photoelectron spectroscopic study of nitrogen incorporated amorphous carbon films embedded with nanoparticles
Keywords: تعصب بستر; XPS; Filtered cathodic jet carbon arc; Nanoparticle; a-C:N; Substrate bias;
Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films
Keywords: تعصب بستر; SE; ta-C; ta-C:H; ta-C:N; Substrate bias; Carbon bonding;
Reduction of crystallization temperature of the Aurivillius phase in Nd-doped SrBi2Ta2O9 thin films via substrate bias
Keywords: تعصب بستر; SBT thin film; Crystallization temperature; Substrate bias
Structural and mechanical properties of compositionally gradient CrNx coatings prepared by arc ion plating
Keywords: تعصب بستر; Chromium nitride (CrN); Arc ion plating; Substrate bias; Functionally gradient coatings (FGC); Mechanical property;
Effects of substrate bias and nitrogen flow ratio on the surface morphology and binding state of reactively sputtered ZrNx films before and after annealing
Keywords: تعصب بستر; Nitrogen flow ratio; Zirconium nitride; Surface morphology; Substrate bias;
Plasma-assisted deposition of lithium phosphorus oxynitride films: Substrate bias effects
Keywords: تعصب بستر; Lithium phosphorus oxynitride (Lipon); Substrate bias; Plasma-assisted directed vapor deposition (PA-DVD); Hollow cathode plasma
Substrate bias effect on Al–Si and Al–Ge thin film structure
Keywords: تعصب بستر; Nanostructures; Sputtering; Phase separation; Aluminium; Silicon; Germanium; Substrate bias; Al–Si; Al–Ge
Bias effect on microstructure and mechanical properties of magnetron sputtered nanocrystalline titanium carbide thin films
Keywords: تعصب بستر; Substrate bias; Magnetron sputtering; TiC; Mechanical properties
Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films
Keywords: تعصب بستر; PECVD; Microcrystalline silicon; Substrate bias; Plasma diagnostics
Influence of substrate bias on the composition of SiC thin films fabricated by PECVD and underlying mechanism
Keywords: تعصب بستر; 81.05.Hd; 68.55.-a; 81.15.GhSiC; PECVD; Substrate bias; Film
Influence of substrate bias on the structure and properties of ZrN films deposited by cathodic vacuum arc
Keywords: تعصب بستر; ZrN films; Cathodic vacuum arc; Substrate bias
Plasma biasing to control the growth conditions of diamond-like carbon
Keywords: تعصب بستر; Diamond-like carbon films; Substrate bias; Plasma bias; Electron energy loss spectroscopy; Transmission electron microscopy
Correlation between substrate bias, growth process and structural properties of phosphorus incorporated tetrahedral amorphous carbon films
Keywords: تعصب بستر; 81.15.Ef; 78.30.Ly; 78.66.Jg; 68.37; 62.40.+i; Phosphorus incorporated tetrahedral amorphous carbon; Filtered cathodic vacuum arc; Substrate bias; Microstructure; Residual stress; Optical gap;
Substrate bias effect on structure of tetrahedral amorphous carbon films by Raman spectroscopy
Keywords: تعصب بستر; ta–C films; Substrate bias; sp3 content; Raman spectroscopy; Mixing bonds
Influence of substrate dc bias on crystallinity of silicon films grown at a high rate from inductively-coupled plasma CVD
Keywords: تعصب بستر; 78.30.âj; 81.05.Cy; Inductively-coupled plasma; Microcrystalline silicon; High rate deposition; Substrate bias;
Microstructural improvement of sputtered ZrO2 thin films by substrate biasing
Keywords: تعصب بستر; ZrO2; Dielectrics; Substrate bias; Sputtering;
Characteristics of interface between Ta2O5 thin film and Si (100) substrate
Keywords: تعصب بستر; 74.62.Bf; 77.55. +f; 68.55.JkTa2O5; Dielectric; Substrate bias; Sputtering