کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1264217 1496824 2016 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The effect of porous structure of PMMA tunneling dielectric layer on the performance of nonvolatile floating-gate organic field-effect transistor memory devices
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
The effect of porous structure of PMMA tunneling dielectric layer on the performance of nonvolatile floating-gate organic field-effect transistor memory devices
چکیده انگلیسی


• The porous structure of PMMA has high electron capture and release efficiency and high electrical insulating property.
• The porous structure of PMMA has positive impacts on the floating-gate OFET memories.
• The floating-gate OFET memories with high density porous structure of PMMA showed good nonvolatile memory properties.

In this paper, we used the low and high density porous structure of polymethylmethacrylate (PMMA) film as tunneling dielectric layer in the floating-gate organic field-effect transistor (OFET) memory devices. Compared to the thin/thick nonporous structure of PMMA tunneling layer, the porous structure of PMMA tunneling layer had positive impacts on the device performance of the floating-gate OFET memory devices. Moreover, it was found that the memory performance was also increased as pore density of PMMA film increased. The atomic force microscopy (AFM) results of both porous structure of PMMA film and pentacene film on porous structure of PMMA film revealed that high density porous structure of PMMA tunneling layer can produce larger tunneling area and more electron transfer paths between pentacene film and PMMA film, which resulted in high electron capture and release efficiency of the floating-gate OFET memory devices with porous structure of PMMA tunneling layer. In addition, our porous structure of PMMA tunneling layer as well as nonporous PMMA film has high electrical insulating property due to their semi-hollow structure film, which is favourable to maintain stable retention property. Eventually, the floating-gate OFET memory devices with high density porous structure of PMMA tunneling layer showed good nonvolatile memory properties with a large memory window of about 43 V, a high ON/OFF current ratio of about 104, and stable endurance and retention properties. Our results provided a new strategy to achieve the high performance floating-gate OFET memory devices.

Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Organic Electronics - Volume 33, June 2016, Pages 95–101
نویسندگان
, , , , , , , ,