Kinetics of hydrogen in Zr-H and Zr-D systems

We measured dependences of the electrical resistance on time of isothermal annealing for Zr rods saturated electrolytically by hydrogen or deuterium. The annealing of samples was carried out at temperatures 305-498 K. The resistance of inhomogeneously saturated samples increased with the time of annealing. The model of diffusion of the hydrogen from the surface of the sample into its volume described this increase adequately. The resistance of homogeneously saturated samples had a minimum at some time of annealing. We showed that the decrease of the resistance during annealing obeyed the exponential law, and that the characteristic time of the decrease obeyed the Arrhenius law with the activation energy about 0.16 eV. We supposed that the resistance decreases due to the formation of the hydride in the saturated layer or on the boundaries of grains.