کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1281170 | 1497686 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Detailed analysis of factors to influence the electrochemical behaviors of Fe:NiOxFe:NiOx films fabricated by magnetron sputtering technology
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Iron doped nickel oxide films which can work as the oxygen reactive catalysts were deposited by reactive sputtering from an alloy target in this experiment. We studied the influence of the sputtering parameters (working pressure and oxygen content in reactive atmosphere) on the oxygen evolution overpotential. It was found that higher atmospheric pressure and higher oxygen content in reactive atmosphere can effectively decrease the overpotentials of the films to a large extent. By physical analysis from XRD, SEM, EDS and XPS we summarized the factors which can influence the catalytic properties and also analyzed the role of Ni3+Ni3+ ion in films in detail.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Hydrogen Energy - Volume 31, Issue 12, September 2006, Pages 1791–1796
Journal: International Journal of Hydrogen Energy - Volume 31, Issue 12, September 2006, Pages 1791–1796
نویسندگان
Wenjing Wang, Hailing Li, Guohu Kang, Jinzhao Huang, Zheng Xu,