کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1284643 | 1498033 | 2012 | 5 صفحه PDF | دانلود رایگان |
A hierarchically porous NiO film on nickel foam substrate is prepared by a facile ammonia-evaporation method. The self-assembled film possesses a structure consisting of NiO triangular prisms and randomly porous NiO nanoflakes. The pseudocapacitive behaviors of the porous NiO film are investigated by cyclic voltammograms and galvanostatic charge–discharge tests in 1 M KOH. The hierarchically porous NiO film exhibits a high discharge capacitance and excellent rate capability with 232 F g−1, 229 F g−1, 213 F g−1 and 200 F g−1 at 2, 4, 10, and 20 A g−1, respectively. The specific capacitance of 87% is maintained from 2 A g−1 to 20 A g−1. The porous NiO film also shows rather good cycling stability and exhibits a specific capacitance of 348 F g−1 after 4000 cycles.
► We synthesize a hierarchically porous NiO film.
► The hierarchically porous NiO film possesses large surface area (196.8 m2 g−1).
► A specific capacitance of 200 F g−1 can be obtained at a discharging current of 20 A.
► 87% of capacitance is retained when the current density changes from 2 to 20 A g−1.
Journal: Journal of Power Sources - Volume 199, 1 February 2012, Pages 413–417