کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1291896 | 973375 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Copper–vanadium mixed oxide thin film electrodes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, CuO, and copper–vanadium mixed oxides CuO(VOy). The composition, oxidation state and crystallinity of the deposited films were investigated. Electrochemical studies were performed, and the results demonstrated that the mixed oxides have a better electrochemical behavior with a higher capacity and stability in the charge/discharge processes, when compared to the pure CuO films behavior.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Power Sources - Volume 162, Issue 1, 8 November 2006, Pages 679–684
Journal: Journal of Power Sources - Volume 162, Issue 1, 8 November 2006, Pages 679–684
نویسندگان
E.A. Souza, A.O. dos Santos, L.P. Cardoso, M.H. Tabacniks, R. Landers, A. Gorenstein,