کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1292540 | 973390 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Deposition of ZrO2 film by liquid phase deposition
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Deposition of ZrO2 film by liquid phase deposition Deposition of ZrO2 film by liquid phase deposition](/preview/png/1292540.png)
چکیده انگلیسی
In this study, undoped ZrO2 thin films were deposited on single-crystal silicon substrates using liquid phase deposition. The undoped films were formed by hydrolysis of zirconium sulfate (Zr(SO4)2·4H2O) in the presence of H2O. A continuous oxide film was obtained by controlling adequate (NH4)2S2O8 concentration. The deposited films were characterized by SEM, FT-IR, XRD and DTA. Typically, the films showed excellent adhesion to the substrate with uniform particle diameter about 150 nm. The thicknesses of ZrO2 film were about 200 nm after 10 h deposition at 30 °C. These films shows single tetragonal phase after heat treated at 600 °C. High annealing temperature (e.g. 750 °C) may result in the phase transformation of (t)-ZrO2 into (m)-ZrO2.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Power Sources - Volume 159, Issue 1, 13 September 2006, Pages 49–54
Journal: Journal of Power Sources - Volume 159, Issue 1, 13 September 2006, Pages 49–54
نویسندگان
Jain-Ming Lin, Ming-chi Hsu, Kuan-Zong Fung,