کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1296425 | 973781 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Power-law scaling of proton conductivity in amorphous silicate thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Power-law scaling of proton conductivity in amorphous silicate thin films Power-law scaling of proton conductivity in amorphous silicate thin films](/preview/png/1296425.png)
چکیده انگلیسی
Amorphous hafnium silicate, a-Hf0.1Si0.9Ox, thin film with thickness of 32, 41, 55, 80, 110, 120, 180 and 320 nm was prepared by multiple spin-cast process and the proton conductivity across the films was measured at intermediate temperatures (100-400 °C) in dry atmosphere. The morphologically- and compositionally-uniform films were prepared on a substrate as confirmed by SEM, RBS and XPS measurements. a-Hf0.1Si0.9Ox thin film clearly revealed the H/D isotope effect on ionic conductivity, indicating that protonic conduction is dominant in the measured temperature range. The films did not reveal thickness-dependent proton conductivity in dry air and the Ï at given temperatures is almost constant at any thickness. No increment of Ï in a-Hf0.1Si0.9Ox thin films by reduction of thickness might be related to the absence of the highly-conductive acid network with mesoscopically-sized length because of the relatively low concentration of Brønsted acid sites inside films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Ionics - Volume 192, Issue 1, 16 June 2011, Pages 93-96
Journal: Solid State Ionics - Volume 192, Issue 1, 16 June 2011, Pages 93-96
نویسندگان
Yoshitaka Aoki, Hiroki Habazaki, Toyoki Kunitake,