کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1307143 975124 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Synthesis and structure of a hafnium silylamide complex and the chemical vapor deposition of HfxSi1−xO2 films
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی معدنی
پیش نمایش صفحه اول مقاله
Synthesis and structure of a hafnium silylamide complex and the chemical vapor deposition of HfxSi1−xO2 films
چکیده انگلیسی

The complex Hf[N(SiMe2H)2]4 was synthesized, structurally characterized, and used as a precursor with oxygen to prepare hafnium silicate thin films at substrate temperatures ⩾500 °C in a low-pressure CVD process. The as-deposited films were amorphous, and they remained amorphous upon annealing up to 1100 °C.

Tetrakis(bis(dimethylsilyl)amido)hafnium and oxygen produce amorphous hafnium silicate films in a low-pressure CVD process.Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Inorganica Chimica Acta - Volume 362, Issue 2, 20 January 2009, Pages 385–388
نویسندگان
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