Graphene etching controlled by atomic structures on the substrate surface

We etched graphene on a sapphire (1 −1 0 2) surface using the reaction between graphene and hydrogen catalyzed by metal nanoparticles. To investigate effects of the atomic structure of the sapphire substrate on graphene etching, we used sapphire substrate with as-polished, air-annealed, and step-ordered surfaces. We investigated the relationship between the atomic arrangement of sapphire and graphene etching and found that graphene is selectively etched in the [1 −1 0 −1] direction of sapphire. This indicates that atomic structure of the sapphire surface can be used as a template to control graphene etching. By combining the transfer method for graphene sheets grown on metal substrates with the present etching technique, graphene nanoribbons can be fabricated at a wafer level.