Super growth of vertically aligned SWCNTs using self-assembled nanoparticles from CoCrPtOx ultra-thin film

The self-assembly of catalytic nanoparticles by the decomposition of an as-deposited oxidized CoCrPt thin film is investigated, and the feasibility of its use in fabricating vertically aligned SWCNT films at a low synthesis temperature (∼600 °C) by microwave plasma CVD is described. The XPS results indicate that small nanoparticles with the diameters of 3–3.5 nm were formed in the explosion associated with the reduction of PtO2 in the CoCrPtOx film. Cr2O3 is employed to inhibit the agglomeration of nanoparticles and Co is typically involved in the dissolution and precipitation of carbon species for SWCNT growth. These small, self-assembled catalytic nanoparticles obtained from the CoCrPtOx ultra-thin film can be used to fabricate an extremely dense and highly oriented SWCNT film on a silicon wafer at a temperature of ∼600 °C.