کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1419398 | 986040 | 2017 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Chemical vapor deposition of thin graphite films of nanometer thickness
ترجمه فارسی عنوان
رسوب بخار شیمیایی از فیلمهای گرافیت نازک با ضخامت نانومتری
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
انرژی (عمومی)
چکیده انگلیسی
Well-ordered graphite films with a thickness of a few graphene layers have been grown on Ni substrates by chemical vapor deposition (CVD) from a mixture of hydrogen and methane activated by a DC discharge. According to Auger, Raman and scanning tunneling microscopy (STM) data the CVD graphite film thickness is about 1.5 ± 0.5 nm. The graphene layers were perfectly adhered to the substrate surface except for upthrusted ridges of a few tens of nanometers in height. STM has revealed an atomically smooth surface with the atomic arrangement typical of graphite between the ridges. A difference in the thermal expansion coefficients of nickel and graphite is considered as a reason for the ridge formation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Carbon - Volume 45, Issue 10, September 2007, Pages 2017–2021
Journal: Carbon - Volume 45, Issue 10, September 2007, Pages 2017–2021
نویسندگان
A.N. Obraztsov, E.A. Obraztsova, A.V. Tyurnina, A.A. Zolotukhin,