A novel submicron-gap electrode fabrication technology using thermal oxidation

► The electrodes were fabricated by thermal oxidization and traditional IC process. ► The design concept is to realize submicron-level fabrication by micron-level technology. ► The fabrication technology is simple, reproducible, ingenious, low-cost, high-yield. ► The method can avoid the limitation of lithography and rigorous fabrication condition. ► The as-prepared submicron-gap electrodes have potential for bio-electronic devices.