Microstructuring of UV-transparent functionalised films on glass by excimer laser irradiation

KrF excimer laser irradiation was used to remove organic moieties from UV-transparent films of organosilanes on borosilicate glass. High-resolution patterns with different functional groups on glass were obtained by a combination of laser modification and silanisation steps. The local material modification near the ablation threshold of glass was investigated by white light interference microscopy. Change in chemical properties of irradiated surface areas were studied by fluorescence microscopy after an appropriate dying of exposed samples. From the results, the domination of thermo-chemical effects induced by the laser irradiation is derived. Finally, an example is given how the patterned organosilane films can be applied to influence cell growth on glass.