Characterization of mixed phase silicon by Raman spectroscopy

We have examined the common methods for determination of the crystallinity of mixed phase silicon thin films from the TO–LO phonon band in Raman spectra. Spectra are decomposed into contributions of amorphous and crystalline phase and empirical formulas are used to obtain crystallinity either from the integral intensities (peak areas) or from magnitudes (peak maxima). Crystallinity values obtained from Raman spectra excited by Ar+ laser green line (514.5 nm) for a special sample with a profile of structure from amorphous to fully microcrystalline were compared with surface crystallinity obtained independently from atomic force microscopy (AFM). Analysis of the Raman collection depth in material composed of grains with absorption depth 1000 nm in an amorphous matrix (absorption depth 100 nm), was used to explain reasons for systematic difference between surface and Raman crystallinities. Recommendations are given for obtaining consistent results.