Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

► A new route for producing silicon at a high rate was proposed.
► Silicon was generated by aluminothermic reduction in a thermal plasma jet.
► The reaction time was calculated to be a few milliseconds.