کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1530872 | 1512004 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
HOPG surface irradiated by metal cluster complex ions
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The surface sputtering of Si using a proto-type ion gun to utilize metal cluster complexes as ion source has been investigated in detail mainly using Auger spectroscopy and atomic force microscope. The Si surface previously was found to be successfully sputtered with a high sputtering yield and yet resulting in a reasonably smooth surface. However cluster ion beams was not irradiated except Si. Here we report the result of surface irradiated of high orientated pyrolytic graphite (HOPG) using a proto-type compact cluster ion source which has been developed using Os3(CO)12. The irradiated HOPG surface was observed by using atomic force microscope (AFM) and scanning electron microscope (SEM) and AES.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 148, Issues 1–3, 25 February 2008, Pages 132–135
Journal: Materials Science and Engineering: B - Volume 148, Issues 1–3, 25 February 2008, Pages 132–135
نویسندگان
Yoshikazu Teranishi, Kouji Kondou, Takeshi Mizota, Yukio Fujiwara, Akihiro Kushino, Youhei Kobayasi, Kazumasa Nakamura, Masanori Ishizuka, Tsuyoshi Yokosawa, Hidehiko Nonaka,