کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
153309 | 456524 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Y2O3-doped TiO2 films were prepared on glass substrates by means of pulsed DC reactive magnetron sputtering method using titanium and yttrium mixed target. XPS results showed that the films were composed of fully oxidation states of the two elements, Y2O3–TiO2 composite oxides. The existence of yttrium inhibited the crystal growth of TiO2 in the films and Y2O3 mainly presented in its amorphous state in the films. UV–vis transmittance of the films decreased whereas their reflectance increased slightly. Yttrium doping had detrimental effect on photocatalytic activity of the TiO2 films. Photocatalytic degradation efficiency of methyl orange solution declined along with increasing yttrium concentration.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Chemical Engineering Journal - Volume 155, Issues 1–2, 1 December 2009, Pages 83–87
Journal: Chemical Engineering Journal - Volume 155, Issues 1–2, 1 December 2009, Pages 83–87
نویسندگان
Wenjie Zhang, Kuanling Wang, Shenglong Zhu, Ying Li, Fuhui Wang, Hongbo He,