کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1535638 | 1512629 | 2013 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Precise broad-band anti-refection coating fabricated by atomic layer deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
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چکیده انگلیسی
By demarcating the ranges of transition regions on different underlayers in atomic layer deposition (ALD), their effects on broad-band anti-refection (BBAR) coating (400–680 nm) are evaluated. In ALD, comparatively larger transition region of TiO2 on bare BK7 glass severely limits the fabricated precision of BBAR coating with a thin first layer. Considering that the transition region on existent ALD material is much thinner than that on bare substrate, a thick Al2O3 film is inserted as a pre-deposited layer on the substrate to completely overlay the transition region on bare BK7.A good agreement between the designed and experimental curves is obtained, and its average reflectance is 0.535% (400–680 nm) in practice.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics Communications - Volume 292, 1 April 2013, Pages 31–35
Journal: Optics Communications - Volume 292, 1 April 2013, Pages 31–35
نویسندگان
Yanghui Li, Weidong Shen, Yueguang Zhang, Xiang Hao, Huanhuan Fan, Xu Liu,