کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1569311 | 1514254 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Dynamics of deuterium implanted in boron coating film for wall conditioning
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
انرژی هسته ای و مهندسی
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چکیده انگلیسی
Retention and desorption behavior of deuterium implanted into pure boron films has been studied by means of the secondary ion mass spectroscopy. It was found that the process controlling deuterium desorption depended on the temperature. At stage 1, below 573 K, the desorption of deuterium from B–D–B bonds dominated and its diffusion was the rate-determining process. Above 573 K, deuterium was mainly desorbed from B–D bonds, and recombination was the rate-determining process. The effective molecular recombination rate constant of deuterium bound to boron associated with B–D bond was determined by an isothermal annealing experiment.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Nuclear Materials - Volumes 367–370, Part B, 1 August 2007, Pages 1170–1174
Journal: Journal of Nuclear Materials - Volumes 367–370, Part B, 1 August 2007, Pages 1170–1174
نویسندگان
Toshihiko Nakahata, Akira Yoshikawa, Makoto Oyaidzu, Yasuhisa Oya, Yuki Ishimoto, Kaname Kizu, Jyunichi Yagyu, Naoko Ashikawa, Kiyohiko Nishimura, Naoyuki Miya, Kenji Okuno,