کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1583243 1514883 2008 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Characterisation of Ni–Ti thin films produced by filtered arc deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Characterisation of Ni–Ti thin films produced by filtered arc deposition
چکیده انگلیسی

Ti–49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystalline, and were largely parent phase whereas a bulk alloy of the same composition would be expected to be martensite. The stabilisation of the parent phase is proposed to be a grain size effect, with the critical grain size for parent phase stabilisation being about 30 nm.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: A - Volume 473, Issues 1–2, 25 January 2008, Pages 172–179
نویسندگان
, , ,