Investigation of Al-Cr alloy targets sintered by various powder metallurgy methods and their particle generation behaviors in sputtering process

In target manufacturing industry, the formation of brittle IMCs were prone to cracking and were among the root causes of particle generation on the film surface, especially at high power voltage. In addition, IMCs inside a target also greatly affect target machinability. Compared to the conventionally-made (HP and HIP) targets, the fully dense target without IMCs in the boundaries between the Al and Cr phases can be obtained by LTNF (Low temperature novel forming), as shown in flowing picture.294