Suppression of interface roughness between BaTiO3 film and substrate by Si3N4 buffer layer regarding aerosol deposition process

Suppression of interface roughness between BaTiO3 film and substrate by Si3N4 buffer layer regarding aerosol deposition process

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 653, 25 December 2015, Pages 69-76

Hong-Ki Kim, Seung-Hwan Lee, Zhao Yao, Cong Wang, Nam-Young Kim, Soo In Kim, Chang Woo Lee, Young-Hie Lee,