Effect of oxygen pressure on preferred deposition orientations and optical properties of cubic MgZnO thin films on amorphous quartz substrate

Cubic MgZnO thin films were deposited on amorphous quartz substrate by PLD method. Effect of deposition pressure on preferential orientation and optical absorption characteristics of MgZnO thin films were studied. The preferred orientation of cubic MgZnO changed from (2 0 0) to (1 1 1) when deposition pressure increased, and absorption edges of which shift to longer wavelength direction because Mg content of MgZnO thin film decreased. Cubic MgZnO showed much better crystal quality and preferential orientation growth characteristics on proper crystal substrate, because on this substrate the preferred orientation of cubic MgZnO is accordance with that grown in free growth mode on amorphous substrate at special air pressure.

Highlight
► We make cubic MgZnO thin film as an ideal compound material in deep ultraviolet photoelectric devices.
► Increasing air pressure will change preferred orientation of cubic MgZnO thin film.
► Increasing air pressure will change absorption properties of cubic MgZnO.
► High quality single orientation cubic MgZnO thin films could be made on suitable crystal MgO substrate at suitable air pressure.