Physical and mechanical properties of the TixZr1−хN thin films

In this article, how the behaviour of the physical and mechanical properties of the phase composition, elemental composition and microstructure of TiхZr1−хN thin films changes under the influence of the deposition process was studied. The technological parameters and temperature of the deposition process were determined and specified by various ion-plasma methods. It was revealed that the TiхZr1−хN thin film with a volume content of the quaternary TiZrN2 phase of ⩾78% and a zirconium level of more than 30 at.% has the optimal combination of physical and mechanical properties: Н = 36 GPа, Е = 200 GPa, We = 78%, H/E∗ = 0.18 and H3/E∗2 = 1.1 GPa if carried out by cathodic arc evaporation (CAE) at the thin film’s intake temperature Tf = 725 K with a heating rate during the deposition process of Vfilm = 3.7 K/min.

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► Phase and elemental composition of TixZr1−xN thin films.
► Interrelationships between the structure of TixZr1−xN thin film and its properties.
► Mechanical properties of TixZr1−xN thin films.
► The TixZr1−xN thin films with more than 30% Zr exhibit “dense” microstructure.
► The TixZr1−xN thin films with more than 78% volume content of c-TiZrN2 phase exhibit optimal mechanical properties.