Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films

► Anodic vacuum arc deposited films using Constantan wires showed a poor maintenance of stoichiometry. ► The as-deposited films deposited using Constantan wires are stratified and possess a vertical concentration gradient. ► More stoichiometric Constantan films are deposited by bilayered deposition of Cu and Ni, followed by post annealing at 500 °C for 6 h. ► AVA has been found suitable of depositing Chromel and Alumel films to a fair degree of repeatability.